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Mgbaaka Nchedo SiC nke CVD siri ike
E mepụtara mgbanaka nchekwa siri ike nke Semixlab's CVD SiC maka gburugburu ebe a na-etinye plasma, na-enye nkwụsi ike pụrụ iche na plasma, mmetọ dị oke ala, na ndụ ọrụ ogologo oge. Ejiri silicon carbide silicon nke nwere nnukwu njupụta kemịkalụ (CVD) emepụta mgbanaka nchekwa anwụrụ ọkụ, ha na-enye ike iguzogide mbuze na mwakpo kemịkalụ dị elu na plasma, na-eme ka ha dị mma maka usoro etch dị mkpa na mmepụta semiconductor. Anyị na-atụ anya ajụjụ gị ọzọ.
Description
Nhazi Ọdịnihu nke Sub-7nm Etch Yield99.99999% Ọcha Dị Elu | Ịkpụcha HAR Stable | Nhọrọ Ka Mma Maka Mgbaaka Silicon
N'afọ 300+ nke transistors 3D NAND na GAA, ihe oriri ọdịnala bụ isi ihe na-akpata nsogbu mmepụta. Emebere mgbanaka nchekwa siri ike nke Semixlab's CVD SiC iji jikwaa plasma dị elu nke dị mkpa maka nhazi akụkụ dị elu (HAR). Ha na-emepụta gburugburu ebe obibi kwụsiri ike, nke enweghị ihe dị na ya nke mgbanaka silicon (Si) ọkọlọtọ enweghị ike inye.
Ụkpụrụ Ụlọ Ọrụ: Ihe Mere E Ji Eme Mgbanwe Fabs Ka Ha Bịa SiC nke Solid
7-Nines (99.99999%) Ịdị ọcha nke ọla: Site na iji usoro nchekwa ikuku kemịkalụ dị elu anyị, anyị na-enweta ihe ruru unyi ígwè niile < 0.1 ppm. Nke a na-arụ ọrụ dị mkpa n'igbochi ntụpọ ndị metụtara chajị na mmetọ ígwè dị arọ na ibe nchekwa dị elu.
Njikwa Mkpọchi N'akụkụ Precision Edge (ERO): Mgbanaka SiC siri ike anyị na-eme ka iguzogide eletriki kwụsie ike na ike okpomọkụ dị elu (≥ 150 W/m·K). Nke a na-emepụta mkpuchi plasma otu nhata n'akụkụ wafer.
Nke a na-edozi nsogbu Edge Roll-off nke na-emebi ịdị n'otu nke wafer 12-inch.
Nguzogide Mbibi maka Ịkpụcha HAR: Na plasma Fluorine (CF4/CHF3) na Chlorine (Cl2) nke nwere ike dị elu, Solid SiC na-egosi oke mbuze ala nke 80% karịa otu kristal Silicon. Nke a na-agbatị oge PM (Mgbochi Mmezi), na-ebelata nke ukwuu Ọnụ Ego Nnweta (CoO).
Nguzosi Ike "Siri Ike" nke Monolithic: N'adịghị ka Graphite e ji SiC kpuchie, akụkụ anyị bụ SiC dị oke arọ 100%. Nke a na-ewepụ ihe egwu nke Micro-cracking ma ọ bụ Delamination nke mkpuchi, na-egbochi mmetọ nke particle dị egwu n'oge usoro etch dị elu.
Emebere ya maka nyiwe Etch nke Next-Gen
Ebe anyị na-emepụta ihe na-eji usoro CNC na Laser nke dị elu nke nwere usoro 5-axis iji hụ na ha dabara na nkọwapụta OEM 100% maka:
● Ịkpụcha ihe e ji eduzi ihe: Ịkpụcha ihe e ji ...
● Dielectric Etch: Njikọta na nhazi oghere dị elu (HAR).
● Ndakọrịta: Ndochi maka nyiwe Lam Research (Kiyo/Versys), Applied Materials (Centris), na TEL (Tactras/Vigus) ga-anọchi anya ya.
nkọwa
| Nkà na ụzụ | Semixlab CVD SiC siri ike | Akara ụlọ ọrụ (Si) | Mpi Edge |
| Chemical Ọcha | 99.99999% (7N) | 99.999% (5N) | Na-ewepụ ntapu ion |
| Nhazi usoro | 100% β-SiC (Cubic) | Otu Crystal Si | Nguzogide etch Isotropic |
| Ikwu njupụta | ≥99.8% (3.20 g/cm3) | N / A | Ọdịdị efu-porosity |
| Vickers ike ike | 28-30 GPA | 9 GPA | Na-eguzogide bọmbụ ion |
| Ogologo Ugwu | Oke <0.2 μm | Ra ~0.5μm | Nrapado polima kacha nta |
ngwa
Oghere ngwa ngwa
Ebe achọrọ ịdị ọcha dị oke elu na iguzogide plasma, CVD Solid SiC anyị bụ ọkọlọtọ ụlọ ọrụ:
● Ịtụle 3D NAND na DRAM: E mere ya maka ihe ịma aka nke ịkpụcha ihe osise HAR (High Aspect Ratio). Ọ na-enye nkwụsi ike achọrọ iji mee ka ihe osise ahụ dị elu karịa oyi akwa 300 na-enweghị mgbanwe profaịlụ.
● Oghere Nlebaanya Sub-7nm: Kpọmkwem maka usoro FinFET na GAA. Anyị na-enyere aka iwepụ mmetọ ígwè, na-echebe eriri dị nro nke transistor ọgbọ ọhụrụ.
● Ebe a na-eji ike Semiconductor eme ihe: Ma ọ bụ SiC epitaxy ma ọ bụ ihe e ji atụgharị olulu miri emi maka GaN, akụkụ anyị na-ejikwa nnukwu okpomọkụ nke mmepụta bandgap sara mbara.
● TSV na Nkwakọ ngwaahịa dị elu: Emebere ya maka usoro Through-Silicon Via, na-ahụ na akụkụ ahụ dị nro ma dịkwa mma maka njikọta 2.5D/3D.
anyị Ọrụ
