mgbanaka ntuziaka mkpuchi TaC

Emebere mgbanaka ntuziaka mkpuchi TaC nke Semixlab site na nkenke na arụmọrụ n'uche, emebere ya ka ọ guzogide oke ọnọdụ nke gburugburu oke okpomọkụ yana corrosive semiconductor. N'iji mkpuchi CVD TaC dị elu (Chemical Vapor Deposition of Tantalum Carbide), akụrụngwa a na-enye ogologo ndụ na-enweghị atụ, nkwụsi ike ọkụ, na nguzogide kemịkalụ.

Dị ka onye na-emepụta mgbanaka mgbanaka TaC tụkwasịrị obi, Semixlab na-enye azịza ahaziri nke na-eme ka ọ dakọtara na ọtụtụ sistemụ nhazi wafer. Ma akpọtụrụ ya dị ka mgbanaka mgbanaka mkpuchi mkpuchi TaC, mgbanaka ntụzịaka TaC, ma ọ bụ mgbanaka CVD TaC, akụrụngwa a dị oke mkpa maka idowe nhazi wafer yana ịdị n'otu na mgbasa na ngwa epitaxy.

Ⅰ Ihe mejupụtara & mkpuchi elu

Ntọala nke mgbanaka ntuziaka Semixlab na-ejikarị graphite dị ọcha ma ọ bụ silicon carbide (SiC), ahọpụtara maka iguzosi ike n'ezi ihe ya na ikuku ọkụ. A na-eji akwa akwa Tantalum Carbide (TaC) kpuchie elu ahụ site na usoro CVD ziri ezi, na-akpụ ihe mgbochi siri ike, siri ike na nke dị nro na-eguzogide iyi, ọgụ kemịkalụ, na mmebi ọkụ.

Akụkụ bụ isi nke mkpuchi CVD TaC:

● Ebe mgbaze dị elu (~ 3880 ° C).

● Nguzogide dị mma na HF, HCl, na gas usoro ndị ọzọ.

● Isi ike pụrụ iche (Mohs 9-10).

● Elu mgbochi urughuru ịwụfu arụmọrụ.

Ⅱ Kedu ihe kpatara ịhọrọ Semixlab?

Semixlab pụtara ìhè n'etiti ndị na-eweta mgbanaka ntụzịaka mkpuchi TaC site n'inye:

● Ọrụ imewe nke a na-ahazi n'ụzọ zuru ezu iji kwekọọ ụdị reactor dị iche iche.

● Nkwekọrịta n'ụdị siri ike maka njikọta enweghị nkebi.

● Ebe nrụpụta ihe dị ala na-ahụ maka ịdị ọcha na ịdị ọcha.

Ndị otu anyị na ndị injinia usoro semiconductor na-arụkọ ọrụ ọnụ iji mepụta usoro Semixlab Guide Ring ahaziri maka ahịrị mmepụta dị elu. Ngwaahịa ọ bụla na-enweta nyocha siri ike iji hụ na mkpuchi mkpuchi na ịdị n'otu na nguzobe n'usoro tupu nnyefe.

Ngwa dị na nrụpụta Semiconductor

1. Plasma Etching - Chebe iguzosi ike n'ezi ihe Wafer n'okpuru Gburugburu Plasma Reactive

N'ime usoro etching plasma dị elu, ebe a na-ekpughere wafers na plasma nwere ike dị elu yana kemịkalụ gas na-arụ ọrụ (dịka CF₄, SF₆, Cl₂, na BCl₃), TaC Coated Guide Ring na-arụ ọrụ dị oke mkpa:

ọ na-eme ka ọ kwụsie ike ma na-echekwa onye na-ebu wafer ma ọ bụ onye susceptor, na-egbochi ihe ọ bụla na-adịghị mma ma ọ bụ ịma jijiji nke nwere ike imetụta nhazi nke ọma.

Nke kachasị mkpa, mkpuchi Tantalum Carbide nke CVD na-etolite ihe mgbochi inert nke kemịkalụ nke na-eguzogide corrosion na mbuze site na ụdị plasma na-emeghachi omume. Nke a na-egbochi mmebi ihe ma na-ewepụ nsị anụ ahụ, nke bụ isi ihe na-akpata micro-contamination na mfu mkpụrụ.

2. Chemical Vapor Deposition (CVD) & Physical Vapor Deposition (PVD) - Ịhụ na Uniform Thin Film Formation

Na ma CVD na PVD usoro, kpọmkwem okpomọkụ akara na kemịkal dị ọcha dị oké mkpa iji nweta elu-edu mkpa ihe nkiri mkpara. N'oge usoro ndị a, mgbanaka ntuziaka na-enyere aka idowe usoro nkwado wafer nke ọma ma hụ na nkesa gasị na-erute n'otu ebe n'elu wafer.

Ihe mkpuchi TaC, yana ebe mgbaze ya dị oke elu (~ 3880 ° C) yana mmeghachi omume dị ala na gas precursor, na-ejigide iguzosi ike n'ezi ihe ọbụlagodi n'okpuru ịgba ígwè ọkụ na ọnọdụ oghere dị elu. N'adịghị ka graphite na-enweghị mkpuchi ma ọ bụ akụkụ ígwè, ọ naghị emeghachi omume na ma ọ bụ na-amịkọrọ gas usoro, nke dị oké mkpa iji zere mmetọ kemịkal.

Uru ndị dị mkpa na CVD/PVD:

● Na-egbochi mgbagha ma ọ bụ ịfegharị akụkụ n'oge uto ihe nkiri na-ekpo ọkụ.

● Na-eme ka gburugburu ebe obibi dị ọcha site na igbochi ikuku gas ma ọ bụ mmekọrịta kemịkalụ.

● Na-akwalite ịdị n'otu n'ofe 200mm na 300mm wafer.

● Ọ dị mma maka itinye ihe nkiri dị elu dị ka SiN, SiO₂, Al₂O₃, TiN na ihe mgbochi.