Etching mgbanaka uche

Na isi semiconductor mmepụta usoro dị ka CVD kemịkalụ vapor deposition, etching, na mkpa film ntinye, Etching Focus Ring (Etching Focus Ring), Electrode (Electrode), ETC (Edge Temperature Controller) na ndị ọzọ na-eri ihe bụ isi ihe iji hụ na usoro ziri ezi na nkwụsi ike. A na-achịkọta ihe ndị a nke ọma n'ime oghere oghere iji nweta otu igwe na-arụ ọrụ nanoscale n'elu wafer site na njikwa ziri ezi nke nkesa plasma, ihu okpomọkụ na ịdị n'otu mpaghara eletrik.

Na nzaghachi nke siri ike chọrọ nke ịdị ọcha na nkwụsi ike na usoro dị elu (dị ka 5nm na n'okpuru), Semixlab ewebatala mgbanaka na-elekwasị anya na ihe eji emepụta ihe na Monocrystalline Silicon dị ọcha dị ka isi ihe, ma e jiri ya tụnyere ihe Quartz ọdịnala. Ọganihu na nguzogide corrosion, nkwụsi ike ọkụ na ihe dielectric.

Ntụle isi ihe: monocrystalline silicon vs. Quartz

1. Nguzogide corrosion Plasma

Monocrystals. N'ịbụ ndị kwekọrọ na ihe ndabere wafer, ha gosipụtara ọnụego etching dị ala na fluorine dabere (CF₄, SF₆) ma ọ bụ chlorine dabere (Cl₂) gburugburu plasma wee bie ihe ruru ugboro 3-5 ogologo oge quartz, na-ebelata oge akụrụngwa na oge nnọchi.

Quartz: Ọ bụ ezie na ọ nwere ezigbo nguzogide okpomọkụ dị elu, ọ dị mfe ịmepụta micro-cracks n'okpuru nnukwu ume ion bombardment, na-ebute ihe ize ndụ dị ukwuu nke mmetọ ahụ, karịsịa na usoro etching ogologo oge.

2. Thermal conductivity na thermal mgbasa ọnụọgụ

Silicon Monocrystalline: conductivity thermal conductivity (149 W / m · K) dị elu karịa nke quartz (1.4 W / m · K), nke nwere ike iduzi usoro okpomọkụ ngwa ngwa ma belata nrụgide okpomọkụ mpaghara. Ọnụ ọgụgụ ya dị ala nke mgbasawanye thermal (2.6×10⁻⁶/K) dakọtara na silicon wafer iji zere nrụrụ akụrụngwa n'ihi mgbanwe okpomọkụ.

Quartz: obere conductivity thermal, dị mfe ịmepụta gradient okpomọkụ n'ime ụlọ, na-emetụta otu plasma; Ọnụ ọgụgụ mgbasawanye nke thermal (0.55 × 10⁻⁶ / K) dị nnọọ iche na nke wafer, nke dị mfe ime ka micro-displacement nke components n'okpuru ogologo oge okpomọkụ.

Njirimara dielectric na nhazi nhazi

Silicon Monocrystal: Ọnwụ dielectric dị obere (tanδ <0.001), enwere ike ịhazi nkesa ọkụ eletrik RF nke ọma iji hụ na nsọtụ n'etiti etiti wafer etching ọnụego dị iche bụ ihe na-erughị 1.5%, na-emezu ihe achọrọ nke usoro dị elu maka ịdị n'otu obosara ahịrị.

Quartz: The dielectric mgbe niile (3.8) dị iche na silicon dabeere gburugburu ebe obibi, nke dị mfe na-eduga na eletriki ubi distortion, na nsọtụ mmetụta dị ịrịba ama, nke na-emetụta na-akpụ agbanwe agbanwe nke elu akụkụ ruru Ọdịdị.

Kedu ihe kpatara ịhọrọ silicon monocrystalline?

N'ime usoro dị elu nke dị n'okpuru 7nm, Window Usoro na-agbada ruo n'ọtụtụ atọm, yana obere ndụ efere ndụ na nnyonye anya ubi eletrik nke ihe oriri quartz ọdịnala aghọwo ihe mgbochi mkpụrụ. Site na homology anụ ahụ na nke kemịkalụ ya na wafers, ihe silicon monocrystalline nwere ike belata nnyonye anya interface, gbasaa usoro mmezi ihe karịrị awa 3,000 ma belata ọnụ ahịa ya site na 40%.

Ngwa ngwa:

1. Aha ndị ọzọ: mgbanaka mgbanaka, mgbanaka mgbanaka, mgbanaka mgbanaka maka etching, mgbanaka na-elekwasị anya silicon monocrystalline.

2. Ngwa: Isoconsumable components bụ isi ihe iji hụ na usoro ziri ezi na nkwụsi ike. A na-achịkọta ihe ndị a nke ọma n'ime oghere oghere iji nweta otu igwe na-arụ ọrụ nanoscale n'elu wafer site na njikwa ziri ezi nke nkesa plasma, ihu okpomọkụ na ịdị n'otu mpaghara eletrik.

3. Core parameters: Thermal conductivity (149 W / m · K), nwere ike na-eduzi usoro okpomọkụ ngwa ngwa, belata nrụgide okpomọkụ mpaghara; Ọnụ ọgụgụ ya dị ala nke mgbasawanye thermal (2.6×10⁻⁶/K) dakọtara na silicon wafer iji zere nrụrụ akụrụngwa n'ihi mgbanwe okpomọkụ.

Ntụnyere data teknụzụ

HAR Etching: Na usoro 3D NAND na TSV (site na silicon), nrụzi kwụsiri ike nke oghere dị n'akụkụ mgbidi dị n'akụkụ.

Atomic Layer etching (ALE): Mwepụ nke otu atomiki n'ígwé site n'ụzọ ziri ezi akara ọkụ eletrik ka ịzena-etching.

Nhazi semiconductor compound: obere ntụpọ etching dakọtara na nnukwu oghere ihe dị ka GaN na SiC.

Nkwenye mmetọ efu: Ihe silicon monocrystalline bụ nke a na-egbu maramara nke ọma (Ra <0.1μm) na ngwugwu ime ụlọ klaasị 10 iji zere mwepụta ihe dị iche iche wee zute ọkọlọtọ ịdị ọcha nke semiconductor (SEMI F47).

Nhazi njikwa okpomọkụ nwere ọgụgụ isi: Modul ETC agbakwunyere, nleba anya oge na nhazi nke ihu ihu site na thermocouple agbakwunyere, nkwụghachi ụgwọ nke chamber thermal drift, iji hụ na ọ ga-emeghachi ya.

Ndakọrịta ahaziri: Kwado oghere na ọkpụrụkpụ ahaziri iche dịka ụdị ọdụ ọdụ ndị ahịa si dị (dịka AMAT Centura, Lam Research Kiyo), maka isi mmalite plasma dị iche iche (ICP, CCP).